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Proceedings Paper

Modeling of a pulsed HF chemical laser pumped by a VUV radiation source
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Paper Abstract

We introduce a numerical investigation of a HF photochemical laser pumped by planar multi-channel sliding discharge to study the possibility of advanced laser characteristic achievement using such pumping source. The model considers transport of VUV pump radiation through the nonlinear absorptive active medium containing NF3/H2/N2Ar gas mixture coupled with chemical and lasing kinetics describing the temporal and spatial evolution of particle species and intracavity lasing photons. The relative importance of various kinetic processes is evaluated and the 3.2 J/liter laser specific energy is calculated.

Paper Details

Date Published: 3 April 2000
PDF: 6 pages
Proc. SPIE 3889, Advanced High-Power Lasers, (3 April 2000); doi: 10.1117/12.380855
Show Author Affiliations
Marc P. Sabonnadiere, IRPHE/Univ. Aix-Marseille I & II (France)
Vadim I. Tcheremiskine, IRPHE/Univ. Aix-Marseille I & II (Russia)
Philippe Ch. Delaporte, IRPHE/Univ. Aix-Marseille I & II (France)
L. D. Mikheev, P.N. Lebedev Physical Institute (Russia)
Marc L. Sentis, IRPHE/Univ. Aix-Marseille I & II (France)

Published in SPIE Proceedings Vol. 3889:
Advanced High-Power Lasers
Marek Osinski; Howard T. Powell; Koichi Toyoda, Editor(s)

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