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Proceedings Paper

Synthesis of metal-nitride films by pulsed laser deposition methods
Author(s): L. Fabian; Laszlo Nanai; Maurizio Martino; Armando Luches; Ion N. Mihailescu
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Paper Abstract

Pulsed laser deposition method (PLD) is widely used nowadays to produce smooth, homogeneous thin films on solid surfaces for microelectronic's purpose. Different metal-nitride films as well as nitrides of W, V, Ta, Ni, Co, Pb have been produced in NH3 and N2 atmosphere of a few on Si surfaces with orientation. In the reaction chamber the pulses of excimer laser at fluence of 5.8 J/cm2 were directed at angle of incidence of 45 degrees to the metallic sheet placed at distance 4.0 cm to the Si substrate. The metallic target was rotated at approximately 3 Hz. Different surface analyzing methods revealed that smooth, homogeneous thin films of the thickness of 20-100 nm were grown on the substrate surface. The chemical composition of the layers varied of metal-silicides to metal-nitrides. In some cases the appearance of carbon and oxygen consisting mixtures such as VNCO, N13Si9O1.5C6 and WN were observed. The film structures might be considered mostly amorphous according to the data of GR-XRD measurements.

Paper Details

Date Published: 25 February 2000
PDF: 6 pages
Proc. SPIE 4070, ALT '99 International Conference on Advanced Laser Technologies, (25 February 2000); doi: 10.1117/12.378174
Show Author Affiliations
L. Fabian, Jozsef Attila Univ. (Hungary)
Laszlo Nanai, Juhasz Gyula Teacher Training College (Hungary)
Maurizio Martino, Univ. of Lecce (Italy)
Armando Luches, Univ. of Lecce (Italy)
Ion N. Mihailescu, Institute of Atomic Physics (Romania)

Published in SPIE Proceedings Vol. 4070:
ALT '99 International Conference on Advanced Laser Technologies
Vladimir I. Pustovoy; Vitali I. Konov, Editor(s)

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