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Proceedings Paper

High-precision mask fabrication for deep-x-ray lithography
Author(s): Andreas Schmidt; Gerhard Himmelsbach; Regina Luettge; Dieter Adam; Falk Hoke; Hartmut Schacke; Nikola Belic; Hans Hartmann; Frank Burkhard; Hermann Wolf
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Paper Abstract

Deep X-ray lithography with synchrotron radiation represents the primary process step of the LIGA technique, by means of which high volume production of micro-mechanical, micro- optical and micro-fluidic components becomes possible. We report on a new approach where the direct patterning of an intermediate mask has been performed by an upgraded Leica ZBA23 shaped beam electron writer with an acceleration voltage of 40 kV. Optimized development and exposure processes as well as the use of particularly performed proximity correction methods allowed to product feature sizes down to 0.4 micrometers . Taking CD-values of the final gold absorber structure as a target, an optimized parameter set has been found to manufacture periodic lines-and-spaces structures of 1.5 micrometers width with an accuracy of 0.18 micrometers per edge which were written into 2 micrometers thick PMMA resist.

Paper Details

Date Published: 3 February 2000
PDF: 9 pages
Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); doi: 10.1117/12.377113
Show Author Affiliations
Andreas Schmidt, Institut fuer Mikrotechnik Mainz GmbH (Germany)
Gerhard Himmelsbach, Institut fuer Mikrotechnik Mainz GmbH (Germany)
Regina Luettge, Institut fuer Mikrotechnik Mainz GmbH (Germany)
Dieter Adam, Leica Microsystems Lithography GmbH (Germany)
Falk Hoke, Leica Microsystems Lithography GmbH (Germany)
Hartmut Schacke, Leica Microsystems Lithography GmbH (Germany)
Nikola Belic, aiss GmbH (Germany)
Hans Hartmann, aiss GmbH (Germany)
Frank Burkhard, Photronics MZD GmbH (Germany)
Hermann Wolf, Photronics MZD GmbH (Germany)

Published in SPIE Proceedings Vol. 3996:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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