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Proceedings Paper

Improvements to mask inspectability by use of pattern proximity correction
Author(s): Anja Rosenbusch; Vicky Bailey; Yair Eran; Reuven Falah; Neil J. Holmes; Andrew C. Hourd; Andrew McArthur; Wolfgang Staud
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Paper Abstract

Inspection is one of the major challenges in mask making, as it is one of its most performance crucial steps in the entire mask making process. Especially contact patterns show difficulties in die-to-database inspection as the CAD data asks for square corners. The paper presents the impact of Laser Proximity Correction (LPC) on the inspectability of contact and line patterns. LPC is a mask enhancement technique improving image quality and CD linearity for laser pattern generators. The use of the linewidth bias monitor tool in order to characterize CD uniformity over the entire plate is demonstrated.

Paper Details

Date Published: 3 February 2000
PDF: 10 pages
Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); doi: 10.1117/12.377109
Show Author Affiliations
Anja Rosenbusch, Sigma-C Inc. (United States)
Vicky Bailey, Compugraphics International Ltd. (United Kingdom)
Yair Eran, Applied Materials, Inc. (Israel)
Reuven Falah, Applied Materials, Inc. (Israel)
Neil J. Holmes, Compugraphics International Ltd. (United Kingdom)
Andrew C. Hourd, Compugraphics International Ltd. (United Kingdom)
Andrew McArthur, Applied Materials, Inc. (United States)
Wolfgang Staud, Applied Materials, Inc. (United States)

Published in SPIE Proceedings Vol. 3996:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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