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Proceedings Paper

F2 laser ablation process of silica glass
Author(s): Hironari Mikata; Takahisa Jitsuno; Keiu Tokumura; Shinji Motokoshi; Masahiro Nakatsuka
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Paper Abstract

The laser ablative figuring of the silica glass has been investigated experimentally. F2 laser and ArF excimer lasers are used as the laser light source for efficient ablation of silica glass material. The output beam of F2 and ArF laser were focused on to the surface of silica glass plate. The ablation rate were measured by a surface profilometer. The process on the surface was done by scanning in X-Y direction and a uniform ablation was observed. However the surface roughness was large as compared with the case of PMMA. The waveform of incident and transmitted laser light was measured by high speed photo-tubes to observe the time dependence of the absorption. The measured waveform indicates that the absorption was small at the leading edge of the laser pulse, and a strong ablation was induced at the latter part of laser pulse due to the excited state absorption. These phenomena are quite similar to both in F2 and ArF laser light. We have developed a simple model in which the instantaneous absorption is defined by the absorbed energy prior to the moment.

Paper Details

Date Published: 1 February 2000
PDF: 8 pages
Proc. SPIE 3885, High-Power Laser Ablation II, (1 February 2000); doi: 10.1117/12.376989
Show Author Affiliations
Hironari Mikata, Institute of Laser Engineering/Osaka Univ. (Japan)
Takahisa Jitsuno, Institute of Laser Engineering/Osaka Univ. (Japan)
Keiu Tokumura, Nalux Co., Ltd. (Japan)
Shinji Motokoshi, Institute for Laser Technology (Japan)
Masahiro Nakatsuka, Institute of Laser Engineering/Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 3885:
High-Power Laser Ablation II
Claude R. Phipps; Masayuki Niino, Editor(s)

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