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Proceedings Paper

Fractal modeling of porous semiconductors
Author(s): Vladimir M. Aroutiounian; Mher Zh. Ghoolinian
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Paper Abstract

In the present paper it is shown that one can present the porous semiconductor as a set of clusters of silicon atoms surrounded by SiOx, as well as the single crystalline silicon substrate can be considered as an infinite cluster also. The formulae for the estimation of variable porosity of the material (including the value of critical porosity-- the percolation threshold, after which the characteristic phenomena are expected in porous silicon) and the forbidden bandgap value of clusters are suggested as functions of the sizes of nanocrystallites. A new fractal model of pore creation on the surface of a material is proposed also. The cases of semi-spherical, conical (V-groove dielectric isolation technology) and cylindrical (U-groove dielectric isolation technology) are considered. Formulae for the formed surface area S, material porosity p as a function of the depth and fractal dimension are obtained.

Paper Details

Date Published: 28 December 1999
PDF: 12 pages
Proc. SPIE 4060, New Trends in Atomic and Molecular Spectroscopy, (28 December 1999); doi: 10.1117/12.375283
Show Author Affiliations
Vladimir M. Aroutiounian, Yerevan State Univ. (Armenia)
Mher Zh. Ghoolinian, Yerevan State Univ. (Armenia)

Published in SPIE Proceedings Vol. 4060:
New Trends in Atomic and Molecular Spectroscopy
Gagik G. Gurzadyan; Artashes V. Karmenyan, Editor(s)

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