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Proceedings Paper

New mask blank handling system for the advanced electron-beam writer
Author(s): Shusuke Yoshitake; Kenji Ooki; Ryoichi Hirano; Toru Tojo; Yoji Ogawa; Katsuhito Ogura; Teruaki Yamamoto; Masaki Toriumi; Yoshiaki Tada
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Paper Abstract

Meeting the latest requirements of aggressive users for the advanced mask for optical lithography will be difficult. In addition, improving the productivity and throughput of the advanced mask with high-density pattern data is necessary. To overcome these hurdles, Toshiba Corp. and Toshiba Machine Co., Ltd. have developed the new advanced mask writer, the EBM- 3000, shown in Figure 1. The EBM-3000 especially takes measures against airborne contamination in the load-lock chamber. Three components of the mask blank handling system have a function as mini environment. To link each of these components, it also employs a standard mechanical interface, SMIF, based on the concept of local cleaning technology. This paper is intended to describe the design concept of the new mask blank handling system for the EBM-3000, and prove these measures to be effective against airborne contamination by the experimental results.

Paper Details

Date Published: 30 December 1999
PDF: 11 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373383
Show Author Affiliations
Shusuke Yoshitake, Toshiba Corp. (Japan)
Kenji Ooki, Toshiba Corp. (Japan)
Ryoichi Hirano, Toshiba Corp. (Japan)
Toru Tojo, Toshiba Corp. (Japan)
Yoji Ogawa, Toshiba Corp. (Japan)
Katsuhito Ogura, Toshiba Machine Co., Ltd. (Japan)
Teruaki Yamamoto, Toshiba Machine Co., Ltd. (Japan)
Masaki Toriumi, Toshiba Machine Co., Ltd. (Japan)
Yoshiaki Tada, Toshiba Machine Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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