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Proceedings Paper

Defect printability measurement on the KLA-351: correlation to defect sizing using the AVI metrology system
Author(s): Peter Fiekowsky; Daniel Selassie
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Paper Abstract

The search for the 'holy grail' of a fast, reliable, inexpensive predictor of defect printability has reached a new level. Taking images from several inspection tools (KLA-351, KLA-353, and KLA Starlight) during defect review, the AVI Photomask Metrology System provides measurement repeatability better than 5 nm, and significantly better correlation to printability than Scanning Electron Microscope (SEM) measurements. SEM measurements of printed defects are compared to various measurements of the defects on the mask. Analysis shows, as expected, that optical area measurements provide the best correlation to printability. Further, images from existing inspection tools are shown to be sufficient to produce these measurements using AVI's new 'Flux-area' technique.

Paper Details

Date Published: 30 December 1999
PDF: 6 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373371
Show Author Affiliations
Peter Fiekowsky, Automated Visual Inspection (United States)
Daniel Selassie, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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