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Proceedings Paper

Defect sensitivity and inspectability of the KLA SEMSpec for alternating phase-shift masks
Author(s): Jason M. Benz
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Paper Abstract

Defect inspection and repair have been the most challenging aspect for manufacturing implementation and fabrication of alternating phase-shift technology. Optical inspection tools have difficulty detecting quartz defects because no substantial transmission difference exists between the quartz substrate and the phase-shifted regions. The presence of the phase transition regions also adds problems for optical tools by creating false defects, decreased sensitivity, or additional data sets. The following report explores the sensitivity of the KLA SEMSpec to several defect types, and sizes. The non-optical SEMSpec demonstrates some advantage over optical tools when detecting quartz, or phase defects. In contrast, the SEMSpec fails to match optical tools when considering chrome, or opaque defects. Several inspectability issues such as copper defects, and tri-tones also arise for each inspection technique which hampers manufacturability.

Paper Details

Date Published: 30 December 1999
PDF: 8 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373360
Show Author Affiliations
Jason M. Benz, IBM Microelectronics Div. (United States)

Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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