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Proceedings Paper

High-resolution thickness measurements and evaluation of a photomask blank
Author(s): Teruyoshi Hirano; Ryuji Matsuo; Kozue Tomiyama; Ichiro Yazawa; Hiroshi Wada; Masao Otaki; Kazuhiko Omote
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Paper Abstract

The film thickness estimation is one of most important subject for the design up of photomask blanks. For control of photomask specifications, the thickness measurement technology is the key of well-designed photomask blanks. The grazing- incidence X-ray reflectivity technology is very useful in order to measure thickness, density and interface roughness of photomask blank. In this paper, we reported the adaptation of the X-ray reflectivity technology to photomask evaluation. A Cr and ZrSi oxide thin photomask blanks were prepared with DC sputtering method. The X-ray reflectivities of those photomask blanks were measured with RIGAKU ATX-E diffractometer system. The thicknesses and densities of the photomask blanks were calculated with RIGAKU XDD degree(s) program. The coincidence between the calculated X-ray reflectivity curves with surface modified model which was defined with a surface oxidized layer is better than the calculated results without a surface oxidized layer. These results indicate that the photomask blanks have a surface oxidized layer. Thicknesses of the same position with same films were measured by ordinary technologies, for example, microscopic observation and thickness measurement technologies. The accuracy of those layer parameters which were calculated with X-ray reflectivity curves were better than those parameters measured with other microscopic and thickness measurement technologies.

Paper Details

Date Published: 30 December 1999
PDF: 11 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373351
Show Author Affiliations
Teruyoshi Hirano, Toppan Printing Co., Ltd. (Japan)
Ryuji Matsuo, Rigaku Corp. (Japan)
Kozue Tomiyama, Toppan Printing Co., Ltd. (Japan)
Ichiro Yazawa, Toppan Printing Co., Ltd. (Japan)
Hiroshi Wada, Toppan Printing Co., Ltd. (Japan)
Masao Otaki, Toppan Printing Co., Ltd. (Japan)
Kazuhiko Omote, Rigaku Corp. (Japan)

Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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