Share Email Print

Proceedings Paper

Extension of graybeam writing for the 130-nm technology node
Author(s): Jan M. Chabala; Frank E. Abboud; Charles A. Sauer; Suzanne Weaver; Maiying Lu; Henry Thomas Pearce-Percy; Ulrich Hofmann; Matthew Vernon; Dinh Ton; Damon M. Cole; Robert J. Naber
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

This paper describes improvements in column design and writing strategy that, together, enable mask production for the 130 nm technology node. The MEBESR 5500 system employs a new high-dose electron gun and column design. We summarize experiments relating lithographic quality to increased dose and the effects of spot size and input address on lithography. These experiments are performed with ZEP 7000 resist and dry etch. A new graybeam writing strategy, Multipass Gray-II (MPG- II), is described in detail. This strategy creates eight dosed gray levels and provides increased writing throughput (up to 8X, compared to single-pass printing) without loss of lithographic quality. Significantly, critical dimension (CD) uniformity, butting, and other important specifications are improved with MPG-II. Lithographic results and throughput data are reviewed. A consequence of the improvement in CD control and throughput is greater productivity for 180 nm devices.

Paper Details

Date Published: 30 December 1999
PDF: 13 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999);
Show Author Affiliations
Jan M. Chabala, Etec Systems, Inc. (United States)
Frank E. Abboud, Etec Systems, Inc. (United States)
Charles A. Sauer, Etec Systems, Inc. (United States)
Suzanne Weaver, Etec Systems, Inc. (United States)
Maiying Lu, Etec Systems, Inc. (United States)
Henry Thomas Pearce-Percy, Etec Systems, Inc. (United States)
Ulrich Hofmann, Etec Systems, Inc. (United States)
Matthew Vernon, Etec Systems, Inc. (United States)
Dinh Ton, Etec Systems, Inc. (United States)
Damon M. Cole, Etec Systems, Inc. (United States)
Robert J. Naber, Etec Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?