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Proceedings Paper

CD performance of a new high-resolution laser pattern generator
Author(s): Per Liden; Tomas Vikholm; Lars Kjellberg; Mans Bjuggren; Klas A. Edgren; John-Oscar Larson; Steven Haddleton; Per Askebjer
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Paper Abstract

CD uniformity is one of the most critical parameters for mask making today. The mask error factor (MEF) in lithography for features that are smaller than the stepper wavelength means that any CD error is transferred to the wafer to a greater extent than the stepper reduction factor would indicate. CD results form a new laser pattern generator, the Omega6000 product line, will be presented. The system features an acousto-optic deflection architecture specifically designed to meet the CD requirements of 180 nm photomasks. A 0.86 NA final lens provides the high resolution of the system. The CD control and the high resolution makes the system well suited for today's advanced photomasks.

Paper Details

Date Published: 30 December 1999
PDF: 8 pages
Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); doi: 10.1117/12.373335
Show Author Affiliations
Per Liden, Micronic Laser Systems AB (Sweden)
Tomas Vikholm, Micronic Laser Systems AB (Sweden)
Lars Kjellberg, Micronic Laser Systems AB (Sweden)
Mans Bjuggren, Micronic Laser Systems AB (Sweden)
Klas A. Edgren, Micronic Laser Systems AB (Sweden)
John-Oscar Larson, Micronic Laser Systems AB (Sweden)
Steven Haddleton, Micronic Laser Systems AB (Sweden)
Per Askebjer, Micronic Laser Systems AB (Sweden)

Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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