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Proceedings Paper

Continuous sampling air-ICP for metals emission monitoring
Author(s): David P. Baldwin; Daniel S. Zamzow; David E. Eckels; George P. Miller
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Paper Abstract

An air-inductively coupled plasma (air-ICP) system has been developed for continuous sampling and monitoring of metals as a continuous emission monitor (CEM). The plasma is contained in a metal enclosure to allow reduced-pressure operation. The enclosure and plasma are operated at a pressure slightly less than atmospheric using a Roots blower, so that sample gas is continuously drawn into the plasma. A Teflon sampling chamber, equipped with a sampling pump, is connected to the stack that is to be monitored to isokinetically sample gas from the exhaust line and introduce the sample into the air-ICP. Optical emission from metals in the sampled gas stream is detected and monitored using an acousto-optic tunable filter (AOTF)-echelle spectrometer system. A description of the continuous sampling air-ICP system is given, along with some preliminary laboratory data for continuous monitoring of metals.

Paper Details

Date Published: 21 December 1999
PDF: 8 pages
Proc. SPIE 3853, Environmental Monitoring and Remediation Technologies II, (21 December 1999); doi: 10.1117/12.372855
Show Author Affiliations
David P. Baldwin, Iowa State Univ. (United States)
Daniel S. Zamzow, Iowa State Univ. (United States)
David E. Eckels, Iowa State Univ. (United States)
George P. Miller, Mississippi State Univ. (United States)

Published in SPIE Proceedings Vol. 3853:
Environmental Monitoring and Remediation Technologies II
Tuan Vo-Dinh; Robert L. Spellicy, Editor(s)

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