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Proceedings Paper

Review of x-ray collimators for x-ray proximity lithography
Author(s): Stephen M. Lane; Troy W. Barbee Jr.; Stanley Mrowka; Juan R. Maldonado
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Paper Abstract

Simple arguments are given that elucidate the need for x-ray collimator optics in point source proximity lithography. Seven recent collimator optics deigns are briefly described. Three of these designs are described in greater detail: a flat mirror array developed by Xmetrics, Inc.; a polycapillary array developed by X-Ray Optical Systems, Inc.; and a scanning paraboloidal collimator developed by Lawrence Livermore National Laboratory. For the latter two collimators test results using the JMAR Technologies, Inc. laser plasma x-ray point source are given.

Paper Details

Date Published: 23 November 1999
PDF: 11 pages
Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); doi: 10.1117/12.371115
Show Author Affiliations
Stephen M. Lane, Lawrence Livermore National Lab. (United States)
Troy W. Barbee Jr., Lawrence Livermore National Lab. (United States)
Stanley Mrowka, Oxford Research Group (United States)
Juan R. Maldonado, Etec Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 3767:
EUV, X-Ray, and Neutron Optics and Sources
Carolyn A. MacDonald; Kenneth A. Goldberg; Juan R. Maldonado; Huaiyu Heather Chen-Mayer; Stephen P. Vernon, Editor(s)

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