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Proceedings Paper

Sine wave artifact as a means of calibrating structured light systems
Author(s): Kevin G. Harding
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Paper Abstract

Structured light systems made to provide dense data over full image fields present a unique challenge to the task of calibration. Localized artifacts made for CMM or hard gages are often a poor fit for testing actual 3D performance. This paper considers the use of a sine wave artifact to provide a mapping of a calibration matched to full-field capabilities. The sine wave offers the advantages of a continuous function across the full field, with a well defined and easy to analyze shape. Changes in scale in all dimensions, as well as localized variations can be mapped in clear detail using this method.

Paper Details

Date Published: 16 November 1999
PDF: 8 pages
Proc. SPIE 3835, Three-Dimensional Imaging, Optical Metrology, and Inspection V, (16 November 1999); doi: 10.1117/12.370261
Show Author Affiliations
Kevin G. Harding, GE Corporate Research and Development Ctr. (United States)

Published in SPIE Proceedings Vol. 3835:
Three-Dimensional Imaging, Optical Metrology, and Inspection V
Kevin G. Harding, Editor(s)

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