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Proceedings Paper

Uniform large-area thermionic cathode for SCALPEL
Author(s): Victor Katsap; Peter B. Sewell; Warren K. Waskiewicz; Wei Zhu
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Paper Abstract

An electron beam lithography tool, which employs the SCALPEL technique, requires an extremely uniform beam to illuminate the scattering Mask, with the cathode operating in the temperature limited mode. It has been previously shown that LaB6 cathodes are not stable in this mode of operation. We have explored the possibility of implementing refined Tantalum-based emitters in the SCALPEL source cathode, and have developed large-area flat cathodes featuring suitably high emission uniformity under temperature limited operation.

Paper Details

Date Published: 15 November 1999
PDF: 5 pages
Proc. SPIE 3777, Charged Particle Optics IV, (15 November 1999); doi: 10.1117/12.370115
Show Author Affiliations
Victor Katsap, Lucent Technologies/Bell Labs. (United States)
Peter B. Sewell, LAB-6 (Canada)
Warren K. Waskiewicz, Lucent Technologies/Bell Labs. (United States)
Wei Zhu, Lucent Technologies/Bell Labs. (United States)

Published in SPIE Proceedings Vol. 3777:
Charged Particle Optics IV
Eric Munro, Editor(s)

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