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Proceedings Paper

Usage of polarization for high-accuracy micrometrology sensors
Author(s): Michael Totzeck; Harald Jacobsen; Hans J. Tiziani
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Paper Abstract

The general idea of the presented investigations is to use the polarization of the electromagnetic field in high- resolution optical microscopy to get information about sub- wavelength details of topographical structures. The main application is the localization of vertical edges. For structures in non-magnetic materials, polarization effects are caused by the different boundary conditions for the tangential and normal electric field components. Using rigorous numerical simulations we show that two physical- optics model describe the polarization dependent images of vertical edges and sub-wavelength structures: a boundary diffraction wave originating from the tip of the edge and waveguiding effects, respectively. We report on two experimental approach for polarization usage: a) comparison of interference microscopy images for s- and p-polarization, and b) polarization interferometry. The former is capable of 'synthetical microscopy'. Measurements of well defined structures are compared with rigorous numerical simulations.

Paper Details

Date Published: 11 November 1999
PDF: 12 pages
Proc. SPIE 3897, Advanced Photonic Sensors and Applications, (11 November 1999); doi: 10.1117/12.369336
Show Author Affiliations
Michael Totzeck, Univ. Stuttgart (Germany)
Harald Jacobsen, Univ. Stuttgart (Germany)
Hans J. Tiziani, Univ. Stuttgart (Germany)

Published in SPIE Proceedings Vol. 3897:
Advanced Photonic Sensors and Applications
Robert A. Lieberman; Anand Krishna Asundi; Hiroshi Asanuma, Editor(s)

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