Share Email Print

Proceedings Paper

Self-cleaning effect and compensation mechanisms in Cl-doped high-resistivity cadmium telluride
Author(s): Vladimir N. Babentsov; Victoria Corregidor; Klaus-Werner Benz; Tobias Feltgen; Michael Fiederle; Ernesto Dieguez
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In this report a new up to dated view on the compensation mechanism in CdTe bulk crystals doped with Cl in concentration up to 1019 cm-3 is given. This concentration of Cl doping gives a high resistivity material. The chlorine atoms can act as shallow donors being in Te sites or can form complex with cadmium vacancies, so called A-centers. Spatially resolved EDAX mapping of CdTe doped revealed nonstoichiometrical areas distributed over the surface. In these areas there are a high concentration of impurities, where the Cl is located in a very small inclusions, while Na is distributed all over the volume of the big inclusions. After a short-time annealing (4 hours) at low temperature (500 degree(s)C) in Cd atmosphere the areas with deviation from stoichiometry mostly disappeared as well as the inclusions which were present inside. This paper includes a review of the different aspects, which can influence a precise compensation mechanism in a non-doped and Cl doped CdTe.

Paper Details

Date Published: 26 October 1999
PDF: 8 pages
Proc. SPIE 3794, Materials and Electronics for High-Speed and Infrared Detectors, (26 October 1999); doi: 10.1117/12.366734
Show Author Affiliations
Vladimir N. Babentsov, Univ. Autonoma de Madrid (Spain) and Institute of Semiconductor Physics (Germany)
Victoria Corregidor, Univ. Autonoma de Madrid (Spain)
Klaus-Werner Benz, Univ. Freiburg (Germany)
Tobias Feltgen, Univ. Freiburg (Germany)
Michael Fiederle, Univ. Freiburg (Germany)
Ernesto Dieguez, Univ. Autonoma de Madrid (Spain)

Published in SPIE Proceedings Vol. 3794:
Materials and Electronics for High-Speed and Infrared Detectors
Walter F. Kailey; Stephen M. Goodnick; Randolph E. Longshore; Walter F. Kailey; Randolph E. Longshore; YongHang Zhang, Editor(s)

© SPIE. Terms of Use
Back to Top