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Proceedings Paper

Differential intensity detection of surface defect scattering
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Paper Abstract

A continuous reduction of design rule in the semiconductor industry requires more than the present state-of-the-art laser surface scanners can achieve. In this paper, a description is given of the proposed methodology which possibly enhance the sensitivity in the detection of surface defects and particles. In the methodology, concentric two beams, long-focused and short focused beams, are incident on the surface. The scattered signal of each beam is detected alternatively, and subtracted. While the haze (mocroroughness signal) is only slightly changed, the defect signal change considerably. The present scattering formula has been modified for the theoretical consideration, and the scattered signal in the incidence plane has been numerically calculated with the appropriate parameter values. The results are presented and more discussions about the advantages of the method are described.

Paper Details

Date Published: 25 October 1999
PDF: 9 pages
Proc. SPIE 3784, Rough Surface Scattering and Contamination, (25 October 1999); doi: 10.1117/12.366720
Show Author Affiliations
Byong Chon Park, Korea Research Institute of Standards and Science (South Korea)
Yun Woo Lee, Korea Research Institute of Standards and Science (South Korea)
Beomhoan O, Inha Univ. (South Korea)

Published in SPIE Proceedings Vol. 3784:
Rough Surface Scattering and Contamination
Zu-Han Gu; Philip T. C. Chen; Zu-Han Gu; Alexei A. Maradudin; Alexei A. Maradudin, Editor(s)

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