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Proceedings Paper

Diffusion mechanisms in microlithographic thin polymeric films
Author(s): Dan V. Nicolau; Takahisa Taguchi; Susumu Yoshikawa
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Paper Abstract

The contribution proposes relationships for the diffusivity of small molecular species in resist systems; then reviews the possible mechanisms in thin polymeric films, namely simple Fickian, Case II, and diffusion accompanied by chemical reaction, with relevance to microlithography processes. The review of the kinetics reveals the inconsistencies in the models advanced for two important microlithographic processes: (i) silylation in Surface Imaging patterning; and (ii) the deactivation of the Chemical Amplification resist due to the parasitic diffusion of N-methyl-pyrolid-one. These inconsistencies can be easily and elegantly resolved only if the polymeric thin film system is supposed to exhibit a kinetics consistent with the diffusion accompanied by chemical reaction.

Paper Details

Date Published: 1 October 1999
PDF: 6 pages
Proc. SPIE 3892, Device and Process Technologies for MEMS and Microelectronics, (1 October 1999); doi: 10.1117/12.364491
Show Author Affiliations
Dan V. Nicolau, Swinburne Univ. of Technology (Australia)
Takahisa Taguchi, Osaka National Research Institute (Japan)
Susumu Yoshikawa, Osaka National Research Institute (Japan)

Published in SPIE Proceedings Vol. 3892:
Device and Process Technologies for MEMS and Microelectronics
Kevin H. Chau; Sima Dimitrijev, Editor(s)

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