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Proceedings Paper

Active vision approach for optimizing illumination in critical surface inspection by machine vision
Author(s): Tilo Pfeifer; Lorenz Wiegers
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Paper Abstract

This paper describes a new method for the adaptive control of imaging parameters in automized machine vision systems. By these new methods even in case of critical objects, which show metal and specular reflections or having polished surfaces, the imaging parameters like illumination can be adjusted optimally without any prior knowledge about the surface characteristics. As a result, an image is generated, which is almost free of irrelevant information in the image. This optimized image only contains the 'real' edges actually found on the object's surface and is free of effects resulting from specular reflections or shadows. Surface inspection for scratches, texture analysis or for dimensional measurements becomes much more reliable now.

Paper Details

Date Published: 21 September 1999
PDF: 6 pages
Proc. SPIE 3824, Optical Measurement Systems for Industrial Inspection, (21 September 1999); doi: 10.1117/12.364248
Show Author Affiliations
Tilo Pfeifer, Technische Univ. Aachen (Germany)
Lorenz Wiegers, Technische Univ. Aachen (Germany)

Published in SPIE Proceedings Vol. 3824:
Optical Measurement Systems for Industrial Inspection
Malgorzata Kujawinska; Wolfgang Osten, Editor(s)

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