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Proceedings Paper

Fabrication of CVD-SiC thin shells for x-ray optic applications
Author(s): Jitendra Singh Goela; Michael A. Pickering; Lester M. Cohen
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Paper Abstract

CVD SILICON CARBIDE shells have been fabricated by a scalable chemical vapor deposition vapor deposition process to demonstrate the feasibility of producing thin, lightweight optics for x-ray applications. These shells were produced by depositing SiC on shaped graphite mandrels in a CVD chamber, removing the graphite mandrels from SiC deposit followed with controlled machining to produce the required double cone surface. the size of these shells is as follows: diameter equals 250-600 mm, length equals 240-400 mm and thickness equals 1.5-2.7 mm. The roundness of the inside surface of these shells was the inside surfaces of a few shells by the epoxy replication process. Testing of two SiC shells for x-ray applications yielded a half energy width of < 15 arcsecs over a wide field of view. Important issues involved in near-net-shaping and machining of these shells are discussed.

Paper Details

Date Published: 29 September 1999
PDF: 12 pages
Proc. SPIE 3766, X-Ray Optics, Instruments, and Missions II, (29 September 1999);
Show Author Affiliations
Jitendra Singh Goela, Rohm and Haas (United States)
Michael A. Pickering, Rohm and Haas (United States)
Lester M. Cohen, Smithsonian Astrophysical Observatory (United States)

Published in SPIE Proceedings Vol. 3766:
X-Ray Optics, Instruments, and Missions II
Richard B. Hoover; Arthur B. C. Walker II, Editor(s)

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