Share Email Print

Proceedings Paper

Aerial image analysis based on UV reticle inspection
Author(s): Wolfgang Staud; Yair Eran; Gidon Gottlib; A. Chereshnya
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Sub-wavelength or Super-resolution lithography requires us to review defects after reticle inspection, be it at the mask house or at incoming inspection, with a completely new approach. With the advent of UV reticle inspection for the 0.25 micrometer and below regime, the lithography engineer in a wafer fab will ask for much more detailed classification and characterization of a reticle. While reticles are supposedly 100% defect free when they arrive at the customer, a detailed analysis of any potential printable defect is done by fab engineers as well as many mask engineers. A time consuming and QUALITATIVE analysis is often performed by AIMS metrology, however, no real QUANTITATIVE estimate of the 'printability' can be given. This paper discusses the solution of using fast aerial image analysis of defect information gathered by an advanced UV inspection system, with accurate printability prediction. The described methodology is on-line, real-time, and can be performed in an automatic mode with any inspection.

Paper Details

Date Published: 25 August 1999
PDF: 7 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360248
Show Author Affiliations
Wolfgang Staud, Applied Materials (United States)
Yair Eran, Applied Materials (Israel)
Gidon Gottlib, Applied Materials (Israel)
A. Chereshnya, Applied Materials (United States)

Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?