Proceedings Paper
Evaluation method of 0.15- to 0.25-um advanced reticle inspection system| Format | Member Price | Non-Member Price |
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Paper Abstract
Reticle inspection has been critically important for the sub- quarter micron generation IC industry. A good mask inspection tool has to provide enough sensitivity to capture all types of printable defects while avoids false alarms that generate production issues. It is important to develop a standard evaluation method to test the capability of different inspection machines. In this paper, we will discuss our standard evaluation method for new reticle inspection systems. A standard test pattern has been designed. Test results on a KLA 303 system will be displayed.
Paper Details
Date Published: 25 August 1999
PDF: 9 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360231
Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)
PDF: 9 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360231
Show Author Affiliations
Andre Wang, Taiwan Mask Corp. (Taiwan)
Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)
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