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Proceedings Paper

Comparative evaluation results of CMS replacement resist for e-beam reticle fabrication
Author(s): Hideo Kobayashi; Takao Higuchi; Keishi Asakawa; Yasunori Yokoya; Tetsuya Wada
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Paper Abstract

Looking for a CMS replacement resist is an urgent assignment for e-beam reticle fabrication, which enables us to maintain flexibility of reticle fabrications. CMS-EX series was discontinued in 1995, and its stored resin will be used up completely sooner in this year 1999. We then tried to find a replacement resist, and examined commercially available resist SEL-N1000, SEL-N1100 and ZEN4400. We studied their behavior to post-spin baking temperature respectively, in order to bring out their potential, by investigating isolated clear pattern fidelity in details as it was the most tough one to make by a negative-working resist. This paper describes our comparative evaluation results of commercially available negative-working resists to determine a CMS-EX-S replacement for e-beam reticle fabrication.

Paper Details

Date Published: 25 August 1999
PDF: 10 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360201
Show Author Affiliations
Hideo Kobayashi, HOYA Corp. (Japan)
Takao Higuchi, HOYA Corp. (Japan)
Keishi Asakawa, HOYA Corp. (Japan)
Yasunori Yokoya, HOYA Corp. (Japan)
Tetsuya Wada, HOYA Corp. (Japan)

Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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