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Proceedings Paper

EB_PEC by using OPC software
Author(s): Kenny Yang
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Paper Abstract

Proximity effect is a major source of CD variation in EB process, many solution had been proposed to solve this problem on EB writer, but it is very difficult to handle all kind of pattern and the pattern environment is getting more and more complex. Recent OPC software is widely used by wafer fab and the speed of computer platform is improved to make it less painful to run the OPC software. It is not much theoretical difference between OPC and EB_PEC for this kind of software, so instead of doing PEC on EB writer, the software EB_PEC may be a good approach.

Paper Details

Date Published: 25 August 1999
PDF: 6 pages
Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); doi: 10.1117/12.360197
Show Author Affiliations
Kenny Yang, Taiwan Mask Corp. (Taiwan)

Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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