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Proceedings Paper

Optical properties of VO2 thin films in their dielectric and metallic states
Author(s): Christophe Petit; Jean Marc Frigerio
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Paper Abstract

Thermochromic VO2 thin films have been deposited by reactive RF cathodic sputtering, using a V2O4 target. They were characterized by XRD, AFM and optical measurements. We show that the microstructure influences the optical response of the material, i.e. its hysteresis cycle as well as the values of the optical constants n and k. We performed ellipsometric measurements from the UV to the far IR, combing two kinds of ellipsometers, in both the dielectric and the metallic states. The n and k constants are described by a dispersion law based on Lorentz oscillators, and an additional Drude contribution for the metallic state. The results are confirmed by XPS analysis. Contrary to the semiconductor phase, the metallic phase appears to be strongly dependent of the microstructure, as far as the optical response is concerned.

Paper Details

Date Published: 7 September 1999
PDF: 8 pages
Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); doi: 10.1117/12.360070
Show Author Affiliations
Christophe Petit, Univ. Pierre et Marie Curie (France)
Jean Marc Frigerio, Univ. Pierre et Marie Curie (France)


Published in SPIE Proceedings Vol. 3738:
Advances in Optical Interference Coatings
Claude Amra; H. Angus Macleod, Editor(s)

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