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Proceedings Paper

Broadband antireflection coatings deposited with ion-assisted evaporation
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Paper Abstract

SiO2, Ta2O5 and MgF2 have been deposited by electron beam evaporation under bombardment of ions generated by three different ion or plasma sources. Multilayer systems containing 5 to 12 layers have been designed and realized. The maximum reflectance R of a glass/air interface can be reduced down to R < 0.5 percent in a spectral region of 400 nm to 700 nm with each of such AR coatings mostly exceeds that of all-oxide system in the shorter wavelength region. With scanning scratch test the scratch resistance of the coatings have been determined relative to each other.

Paper Details

Date Published: 7 September 1999
PDF: 5 pages
Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); doi: 10.1117/12.360066
Show Author Affiliations
Sven Laux, Fraunhofer Institut fuer Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer Institut fuer Angewandte Optik und Feinmechanik (Germany)
Hansjoerg S. Niederwald, Carl Zeiss (Germany)
Michael Mertin, Carl Zeiss (Germany)
Henrik Ehlers, Laser Zentrum Hannover e.V. (Germany)
Detlev Ristau, Laser Zentrum Hannover e.V. (Germany)

Published in SPIE Proceedings Vol. 3738:
Advances in Optical Interference Coatings
Claude Amra; H. Angus Macleod, Editor(s)

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