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Proceedings Paper

Photothermoplastic-based diffraction gratings: fabrication and replication processes
Author(s): Igor V. Ciapurin
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Paper Abstract

Currently a photothermoplastic medium (PTPM) seems to be rather perspective to fabricate relief-phase diffraction gratings (DGs). The use of a two-layer PTPM comprised a photosensitive semiconductor layer and visualizing thermoplastic layer seems to be appropriate' .ThePTPM is characterized by profitable combination of high values of both photosensitivity (up to lO5lO6 cm/J) and resolution (up to 2000 mm1), with a dry developing process which is fast enough (about 1-5 s). The thinner the thermoplastic layer, the higher the resonant frequency of the PTPM and the wider the recording frequency bandwidth are allowing us to realize high-quality recording of DGs. The DGs' fabrication on PTPM seems to have advantages due to the relief-phase nature of recording process, which is rather convenient for replication of DGs2.

Paper Details

Date Published: 19 July 1999
PDF: 2 pages
Proc. SPIE 3749, 18th Congress of the International Commission for Optics, (19 July 1999); doi: 10.1117/12.354863
Show Author Affiliations
Igor V. Ciapurin, State Univ. of Moldova (United States)

Published in SPIE Proceedings Vol. 3749:
18th Congress of the International Commission for Optics
Alexander J. Glass; Joseph W. Goodman; Milton Chang; Arthur H. Guenther; Toshimitsu Asakura, Editor(s)

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