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Proceedings Paper

Future of optical lithography
Author(s): Shinji Okazaki
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Paper Abstract

The history of optical lithography is reviewed as a basis for discussing its future. The key methods used so far to boost the resolution are: the use of a higher numerical aperture, reduction of the exposure wavelength, and the introduction of resolution enhancement technologies. For the continued use of optical lithography in the future, the exposure wavelength must be reduced. The two approaches to doing this--a gradual reduction and a sudden, large reduction--are compared.

Paper Details

Date Published: 19 July 1999
PDF: 2 pages
Proc. SPIE 3749, 18th Congress of the International Commission for Optics, (19 July 1999); doi: 10.1117/12.354770
Show Author Affiliations
Shinji Okazaki, Association of Super-Advanced Electronics Technologies (Japan)

Published in SPIE Proceedings Vol. 3749:
18th Congress of the International Commission for Optics
Alexander J. Glass; Joseph W. Goodman; Milton Chang; Arthur H. Guenther; Toshimitsu Asakura, Editor(s)

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