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Proceedings Paper

Design, figuring, and measurement of a correction plate for a wafer stepper
Author(s): Denis A.M. Faas; Cees J. Van Der Laan; Joseph J. M. Braat; Tark Wijchers
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Paper Abstract

A plate with constant thickness was designed to compensate for the residual distortion in the image projected by a high-quality projection lens for lithography. The two surfaces of the plate have an identical aspheric profile whose shape has been calculated using the measured distortion map of the lithographic objective. The figuring process applied to the plate uses the principle of polishing in the presence of an elastical deformation to achieve the desired aspheric shape on both sides. A description is given of the subsequent process steps and of the obtained surface accuracy.

Paper Details

Date Published: 19 July 1999
PDF: 2 pages
Proc. SPIE 3749, 18th Congress of the International Commission for Optics, (19 July 1999); doi: 10.1117/12.354769
Show Author Affiliations
Denis A.M. Faas, ASML (Netherlands)
Cees J. Van Der Laan, Delft Univ. of Technology (Netherlands)
Joseph J. M. Braat, Delft Univ. of Technology (Netherlands)
Tark Wijchers, Delft Univ. of Technology (Netherlands)

Published in SPIE Proceedings Vol. 3749:
18th Congress of the International Commission for Optics
Alexander J. Glass; Joseph W. Goodman; Milton Chang; Arthur H. Guenther; Toshimitsu Asakura, Editor(s)

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