Proceedings Paper
New generation of very high repetition rate subnanosecond pulsed UV sources| Format | Member Price | Non-Member Price |
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Paper Abstract
We demonstrate a new kind of picosecond laser source in the UV at high repetition rate. This system is based on only passive, compact and simple elements: a microchip laser and a very efficient multipass amplifier both pumped with recently developed high brightness laser diodes. This all- solid-state laser has been optimized for delivering, at a high repetition rate -45 kHz-, sub-nanosecond pulses at the wavelength of 355 nm with an energy per pulse close to 1 (mu) J (or equivalently 38 mW average power). This source is- -to our knowledge--the first totally passive, 300-ps UV laser source at this high repetition rate.
Paper Details
Date Published: 19 July 1999
PDF: 2 pages
Proc. SPIE 3749, 18th Congress of the International Commission for Optics, (19 July 1999); doi: 10.1117/12.354739
Published in SPIE Proceedings Vol. 3749:
18th Congress of the International Commission for Optics
Alexander J. Glass; Joseph W. Goodman; Milton Chang; Arthur H. Guenther; Toshimitsu Asakura, Editor(s)
PDF: 2 pages
Proc. SPIE 3749, 18th Congress of the International Commission for Optics, (19 July 1999); doi: 10.1117/12.354739
Show Author Affiliations
F. Druon, Institut d'Optique Theorique et Appliquee (France)
Francois Balembois, Institut d'Optique Theorique et Appliquee (France)
Francois Balembois, Institut d'Optique Theorique et Appliquee (France)
Patrick M. Georges, Institut d'Optique Theorique et Appliquee (France)
Alain Brun, Institut d'Optique Theorique et Appliquee (France)
Alain Brun, Institut d'Optique Theorique et Appliquee (France)
Published in SPIE Proceedings Vol. 3749:
18th Congress of the International Commission for Optics
Alexander J. Glass; Joseph W. Goodman; Milton Chang; Arthur H. Guenther; Toshimitsu Asakura, Editor(s)
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