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Proceedings Paper

Comparison of CD variation between organic and inorganic bottom antireflective coating on topographic substrates
Author(s): Satoko Nakaoka; Hisashi Watanabe; Yoshimitsu Okuda
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Paper Abstract

This paper describes the CD control of using bottom anti- reflective coating (BARC) processes on topographic substrates for DUV lithography. The CD variation using organic anti-reflective coating (ARC) and inorganic anti- reflective layer (ARL) is different because of their coverage characteristics on topography. We have compared the CD variation of different BARC processes on various step widths and heights. The CD range using highly planarizing ARC was smaller than that using another less planarizing local step is advantageous to CD control on topographic substrates. We analyzed the cause of large CD variation using ARL and found that the impact of the oblique reflection from a photoresist/ARL interface at steps.

Paper Details

Date Published: 26 July 1999
PDF: 10 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354411
Show Author Affiliations
Satoko Nakaoka, Matsushita Electronics Corp. (Japan)
Hisashi Watanabe, Matsushita Electronics Corp. (Japan)
Yoshimitsu Okuda, Matsushita Electronics Corp. (Japan)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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