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Proceedings Paper

Systematic approach to correct critical patterns induced by the lithography process at the full-chip level
Author(s): Chul-Hong Park; Yoo-Hyon Kim; Ji-Soong Park; Kwan-Do Kim; Moon-Hyun Yoo; Jeong-Taek Kong
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Paper Abstract

This paper present a systematic approach to correct critical patterns, which are more prone to defects due to the photo lithography process, at the full-chip level for sub-quarter micron CMOS applications. In the first stage of the photo lithography process for integrated circuits (IC), the bridging failure between patterns in a photoresist layer has been found occasionally. The small process margin in patterning plays a key part of the device yield drop, when process conditions or production lines are changed. However, it is a very difficult and time-consuming job to find and correct all the possible critical patterns which might cause failure. Test patterns with various line-and-spaces are designed and simulated using the aerial image model and the third order polynomial function of critical patterns. The DRC software with the rules searches an entire area of the IC layout. The proposed approach to extract critical patterns is cost effective and fast compared to the evaluation of a layout using a photo lithography simulator at the full-chip level. Applying this methodology to 256M DRAM with 0.25 micrometers minimum design width in the periphery and core area, all bridge defects found before correction can be removed. Furthermore, it will be a useful tool to the product engineer who should indicate monitoring patterns, which are sensitive to the lithography process margin.

Paper Details

Date Published: 26 July 1999
PDF: 8 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354376
Show Author Affiliations
Chul-Hong Park, Samsung Electronics Co., Ltd. (South Korea)
Yoo-Hyon Kim, Samsung Electronics Co., Ltd. (South Korea)
Ji-Soong Park, Samsung Electronics Co., Ltd. (South Korea)
Kwan-Do Kim, Samsung Electronics Co., Ltd. (South Korea)
Moon-Hyun Yoo, Samsung Electronics Co., Ltd. (South Korea)
Jeong-Taek Kong, Samsung Electronics Co., Ltd. (South Korea)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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