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Proceedings Paper

Impact of pellicle damage on patterning characteristics in ArF lithography
Author(s): Junji Miyazaki; Masaya Uematsu; Tohru Ogawa
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Paper Abstract

Pellicle durability and the effect of damaged pellicles on lithographic performance were investigated. It was found that pellicles lose their thickness but do not change their optical constant in an air atmosphere when irradiated by an ArF laser. Changes in pellicle thickness cause a wave aberration change. It was confirmed that this damage affects lithographic performance in simulations and experiments. It was estimated that transmittance of a 1 percent change causes a CD shift of 0.6 nm. We have also found that a lifetime of latest pellicle is over one year. Pellicles are now available with enough durability, as the pellicle durability has been greatly improved.

Paper Details

Date Published: 26 July 1999
PDF: 11 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354364
Show Author Affiliations
Junji Miyazaki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Masaya Uematsu, Semiconductor Leading Edge Technologies, Inc. (Japan)
Tohru Ogawa, Semiconductor Leading Edge Technologies, Inc. (Japan)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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