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Proceedings Paper

Excimer-laser-induced absorption in fused silica
Author(s): Johannes Moll; Paul M. Schermerhorn
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Paper Abstract

Excimer laser radiation changes the physical and optical properties of fused silica. These changes include compaction of the glass and induced absorption, both of which have an impact on the expected lifetime of silica lenses used in optical microlithography. We report on our ongoing study of excimer laser induced changes in fused silica. We use a fully automated experimental setup designed for marathon exposure of the sample at low fluence. In each setup, using either an ArF or a KrF laser, up to five samples are exposed simultaneously and their induced absorption is measured in situ. The spatial and temporal profiles of the laser beam can also be measured in the same setup. We present and discuss results from marathon test of fused silica at fluences close to the conditions expected in optical microlithography systems.

Paper Details

Date Published: 26 July 1999
PDF: 8 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354319
Show Author Affiliations
Johannes Moll, Corning Inc. (United States)
Paul M. Schermerhorn, Corning Inc. (United States)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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