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Proceedings Paper

Billion-level durable ArF excimer laser with highly stable energy
Author(s): Osamu Wakabayashi; Tatsuo Enami; Takeshi Ohta; Hirokazu Tanaka; Hirokazu Kubo; Toru Suzuki; Katsutomo Terashima; Akira Sumitani; Hakaru Mizoguchi
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Paper Abstract

We have succeeded in the development of the ArF excimer laser with high performance and durability, by researching and developing of the spectral measurement and gas control technologies, laser chamber with radio frequency preionizer, the high repetition rate solid state pulse power module and the optimized highly durable optical module. As regards spectral measurement technologies, the true instrumental function of a monitor etalon have been measured by our developed 193nm coherent light source. Spectrum of ArF laser could be obtained precisely by deconvolution performed using the covolved spectrum of the ArF laser and the measured instrumental function of the monitor etalon. As for gas control technologies, the influence of impurities given to the ArF laser performance was bigger about 5-20 times compared with the KrF one. And we have paid attention that low concentration Xe gas has effect to the triple output energy. The durability test of 2 billion pulses has been done for the first time in the world. The developed ArF laser kept the integrated energy stability less than +/- 0.6 percent and spectral band-width of FWHM less than 0.8 pm. The result showed, developed laser has an enough performance for lithography even after the pulse number exceeds 2 billion pulses.

Paper Details

Date Published: 26 July 1999
PDF: 11 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354311
Show Author Affiliations
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Tatsuo Enami, Komatsu Ltd. (Japan)
Takeshi Ohta, Komatsu Ltd. (Japan)
Hirokazu Tanaka, Komatsu Ltd. (Japan)
Hirokazu Kubo, Komatsu Ltd. (Japan)
Toru Suzuki, Komatsu Ltd. (Japan)
Katsutomo Terashima, Komatsu Ltd. (Japan)
Akira Sumitani, Komatsu Ltd. (Japan)
Hakaru Mizoguchi, Komatsu Ltd. (Japan)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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