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Proceedings Paper

Performance of a phase-shift focus monitor reticle designed for 193-nm use
Author(s): Roderick R. Kunz; M. S. Chan; Scott P. Doran
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Paper Abstract

A phase-shift focus monitor reticle designed for 193-nm was characterized on a 0.5-NA 193-nm projection lens. Calibration data were obtained and compared to simulations of the specific lens used. Using a thinned single-layer resist, feature sizes of 150 nm, and a partial coherence of 0.6, a calibration coefficient of roughly 50 nm of image shift per 1 micrometers of defocus was obtained. This relationship was linear through roughly 1.5 micrometers of focus. Once this calibration was determined, the reticle was successfully used to quantify thermal effects resulting from laser- induced heating of the lens. The latter results will only be qualitatively described here.

Paper Details

Date Published: 26 July 1999
PDF: 8 pages
Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); doi: 10.1117/12.354298
Show Author Affiliations
Roderick R. Kunz, MIT Lincoln Lab. (United States)
M. S. Chan, MIT Lincoln Lab. (United States)
Scott P. Doran, MIT Lincoln Lab. (United States)

Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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