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Proceedings Paper

X-ray lithography: a system integration effort
Author(s): Robert A. Selzer; John Heaton; Yuli Vladimirsky; Klaus Simon
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Paper Abstract

Despite growing expectations of significant progress in projection lithography using shorter wavelengths, x-ray lithography is still the most developed and production ready technology compared with the other NGL approaches. For the timely introduction of this technology into the manufacturing environment the development of fully integrated x-ray lithography systems becomes very important. Reflecting manufacturing and R and D demands, the x-ray technology integration has been pursued for goth synchrotron radiation and x-ray point source based approaches. While the synchrotron-based approach provides the high volume platform, the point source will provide the platform for low volume production and R and D efforts. SAL recognizes the needs for both, a synchrotron based stepper as well as a point source stepper and is focused on meeting those needs. This paper will present the status of integration efforts at SAL utilizing a point source system.

Paper Details

Date Published: 25 June 1999
PDF: 4 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351164
Show Author Affiliations
Robert A. Selzer, SAL Corp. (United States)
John Heaton, Sanders, A Lockheed Martin Co. (United States)
Yuli Vladimirsky, Univ. of Wisconsin/Madison (United States)
Klaus Simon, SAL Corp. (United States)

Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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