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Proceedings Paper

Novel fiducial grid for x-ray masks
Author(s): Choi Pheng Soo; Shobhna Chandra; Kong Jong Ren; Antony J. Bourdillon; Bing Lu
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Paper Abstract

Advances in today's semiconductor industry have been achieved mainly by decreasing the minimal feature size thereby increasing the complexity of the devices. Lithography tool shave to provide for high resolution and large depth of focus. X-ray lithography offers promising solutions and is currently an actively researched area.

Paper Details

Date Published: 25 June 1999
PDF: 7 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351158
Show Author Affiliations
Choi Pheng Soo, National Univ. of Singapore (Singapore)
Shobhna Chandra, National Univ. of Singapore (Singapore)
Kong Jong Ren, National Univ. of Singapore (Singapore)
Antony J. Bourdillon, National Univ. of Singapore (Singapore)
Bing Lu, Univ. of Wisconsin/Madison (United States)

Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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