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Proceedings Paper

Direct comparison of EUV and visible-light interferometries
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Paper Abstract

Recent experiments with four 10x EUV imaging systems provide the first direct comparisons of visible-light and at- wavelength EUV interferometers performed using the state-of- the-art measurement tools that will be used to assemble and align the next generation of EUV imaging systems. Measurements from four individual multilayer-coated Schwarzschild objectives are discussed. Favorable agreement has been achieved between EUV and visible-light system wavefront measurements in all four optical systems. Measurements made in the presence of surface contamination and multilayer thickness variation, however, do show expected localized differences between the two measurements.

Paper Details

Date Published: 25 June 1999
PDF: 8 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351138
Show Author Affiliations
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
Sang Hun Lee, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Chang-Hasnain C. Chang, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Cynthia J. Bresloff, Steward Observatory/Univ. of Arizona (United States)
Richard J. Gaughan, Lawrence Livermore National Lab. (United States)
Henry N. Chapman, Lawrence Livermore National Lab. (United States)
John E. M. Goldsmith, Sandia National Labs. (United States)
Jeffrey Bokor, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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