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Proceedings Paper

Simulation of resist heating using TEMPTATION software with different models of electron-beam energy deposition
Author(s): Igor Yu. Kuzmin
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Paper Abstract

In electron lithography, resist heating is a serious practical problem that requires proper modeling. To decrease complexity of the problem, simplified representations of a single electron heat source were examined. This was shown that simplified descriptions can lead to significant errors in temperature simulation. These simple models can only be used for temperature simulation at a long time/long distance from the current electron flash. An analytic mode of electron scattering and Monte Carlo modeling have shown comparably good accuracy when used for thermal simulations. They both were embedded in TEMPTATION software tool.

Paper Details

Date Published: 25 June 1999
PDF: 7 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351126
Show Author Affiliations
Igor Yu. Kuzmin, Set-Service (Russia)


Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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