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Proceedings Paper

Zone-plate array lithography (ZPAL): a new maskless approach
Author(s): David J. D. Carter; Dario Gil; Rajesh Menon; Ihsan J. Djomehri; Henry I. Smith
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Paper Abstract

This paper reviews recent progress in our development of a new maskless lithography scheme which utilizes an array of Fresnel zone plates to write arbitrary patterns on a wafer. Maskless, zone-plate-array lithography (ZPAL) should be capable of producing 25 nm feature sizes at a throughput of 1 cm2/second using 4.5 nm radiation form an undulator on a compact synchrotron. This wavelength will allow a large depth-of-focus with essentially no proximity effect at a large gap between the zone-plate array and the substrate. We present a detailed ZPAL system design, and show calculations and simulations which address issues of resolution, contrast, throughput, source characteristics, and micromechanical modulation schemes for x-ray beamlets in ZPAL. We review our experimental efforts in ZPAL in the x- ray and UV regions.

Paper Details

Date Published: 25 June 1999
PDF: 9 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351104
Show Author Affiliations
David J. D. Carter, Massachusetts Institute of Technology (United States)
Dario Gil, Massachusetts Institute of Technology (United States)
Rajesh Menon, Massachusetts Institute of Technology (United States)
Ihsan J. Djomehri, Massachusetts Institute of Technology (United States)
Henry I. Smith, Massachusetts Institute of Technology (United States)

Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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