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Proceedings Paper

Heating of x-ray masks during e-beam writing
Author(s): Nikolai L. Krasnoperov; Jaz Bansel; Olga Vladimirsky; John P. Wallace; Yuli Vladimirsky; Franco Cerrina
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Paper Abstract

In this work we characterized the temperature increase in SiHN mask membrane during e-beam writing. We observed an exponential decay with a decay length in the order of 1mm-1, and absolute temperature raises of 8 degrees K. This is the first time that direct measurement have been obtained. By fitting the observed data, we have extracted the thermal conductivity and emissivity of the film. These experimental values are essential in the modeling of the response of the masks.

Paper Details

Date Published: 25 June 1999
PDF: 11 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351083
Show Author Affiliations
Nikolai L. Krasnoperov, Univ. of Wisconsin/Madison (United States)
Jaz Bansel, Univ. of Wisconsin/Madison (United States)
Olga Vladimirsky, Univ. of Wisconsin/Madison (United States)
John P. Wallace, Univ. of Wisconsin/Madison (United States)
Yuli Vladimirsky, Univ. of Wisconsin/Madison (United States)
Franco Cerrina, Univ. of Wisconsin/Madison (United States)

Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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