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Proceedings Paper

Gas curtain for mitigating hydrocarbon contamination of EUV lithographic optical components
Author(s): Michael P. Kanouff; Avijit K. Ray-Chaudhuri
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Paper Abstract

Calculations were carried out to study the effectiveness of a gas curtain for mitigating contamination form hydrocarbon gases in extreme UV (EUV) lithography tools. The momentum, energy and mass transport in the curtain and surrounding regions were calculated using a 2D finite volume model of a lithography tool. Argon was used for the gas curtain. The results from the calculations quantify the relationship between the argon flow rate and the hydrocarbon partial pressure in the region of the optical elements. In general, the hydrocarbon partial pressure decreases as the mass transfer Peclet number, Pe equals Vh/D, increases, where V is the velocity of the argon, h is the thickness of the gas curtain and D is the mass diffusivity. An argon flow rate of 12.2 torr 1/s is required to reduce the hydrocarbon partial pressure from 10-7 to 10-10 torr in the specific lithography tool considered here. The EUV transmission in the tool with the gas curtain is 0.93. This is a large improvement over the 0.5 transmission that would result by using a solid filter to contain the hydrocarbon gas.

Paper Details

Date Published: 25 June 1999
PDF: 8 pages
Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); doi: 10.1117/12.351077
Show Author Affiliations
Michael P. Kanouff, Sandia National Labs. (United States)
Avijit K. Ray-Chaudhuri, Sandia National Labs. (United States)

Published in SPIE Proceedings Vol. 3676:
Emerging Lithographic Technologies III
Yuli Vladimirsky, Editor(s)

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