Proceedings Paper
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Paper Abstract
This paper examines the theory, methodology and benefits of using CD distribution as a metric for determining the quality of a lithography process. A method is presented for predicting the CD limited yield of a photolithographic process using a combination of RoCD and either RoLith/2 and RoLith/3D. Several examples are used in order to show the major benefits of this method.
Paper Details
Date Published: 14 June 1999
PDF: 12 pages
Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350878
Published in SPIE Proceedings Vol. 3677:
Metrology, Inspection, and Process Control for Microlithography XIII
Bhanwar Singh, Editor(s)
PDF: 12 pages
Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350878
Show Author Affiliations
Dumitru Gh. Ulieru, ROMES S.A. (Romania)
Published in SPIE Proceedings Vol. 3677:
Metrology, Inspection, and Process Control for Microlithography XIII
Bhanwar Singh, Editor(s)
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