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Proceedings Paper

2001 and beyond: a challenge for metrology
Author(s): Syed A. Rizvi
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Paper Abstract

As the industry moves into the next millennium it faces new challenges that are not only in the fabrication of the sub- 150 nm features but also in the ability to measure those features. The focus of this paper is not as much on the building of machines to measure those small features but rather on the methodologies of interpreting and handling of data and developing intelligence for identifying the edge- positions that have significant contribution on the value of the critical dimensions or CDs.

Paper Details

Date Published: 14 June 1999
PDF: 11 pages
Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350845
Show Author Affiliations
Syed A. Rizvi, Photronics, Inc. (United States)

Published in SPIE Proceedings Vol. 3677:
Metrology, Inspection, and Process Control for Microlithography XIII
Bhanwar Singh, Editor(s)

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