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Proceedings Paper

Multiple CD-SEM matching for 0.18-um lines/spaces at different exposure conditions
Author(s): Andre Engelen; Ingrid Minnaert-Janssen
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Paper Abstract

CD-SEMs are used within ASML for evaluating the imaging performance of Stepper and Step and Scan systems. This implies measuring a large number of focus exposure matrices and inter/intra-field CD measurements on different CD-SEMs. Therefore the CD-SEMs in ASML are matched through focus. The matching procedure is done on three steps. First, all CD- SEMs are checked for stability. Then the magnification factor for each of the individual CD-SEMs is checked in order to make sure that he tool is set up correctly. Finally, the CD measurements are matched through focus and multiple exposure energies. In this paper, we will show that the CD-SEMs of different vendors can be matched using photoresist features, through focus within 5 nm for 0.18 micrometers features. This matching includes different orientations and densities using only one correction offset.

Paper Details

Date Published: 14 June 1999
PDF: 11 pages
Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350817
Show Author Affiliations
Andre Engelen, ASM Lithography B.V. (Netherlands)
Ingrid Minnaert-Janssen, ASM Lithography B.V. (Netherlands)

Published in SPIE Proceedings Vol. 3677:
Metrology, Inspection, and Process Control for Microlithography XIII
Bhanwar Singh, Editor(s)

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