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Proceedings Paper

Matching of different pattern placement metrology systems: an example for practical use of different LMS systems in the inspection process for photomasks
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Paper Abstract

One condition for efficient work with more than one metrology system, in one or several facilities, is the matching of the pattern placement metrology tools. The Siemens mask house uses tow pattern placement metrology systems, an LMS 2000 and an LMS IPRO system. Both system are correlated to the PTB standard and match in between. The different measurement performance of the two systems leads to different applications of their use. Both metrology system have ben matched with external facilities. Data will be presented on metrology correlation with Siemens' two 'second source' sites.

Paper Details

Date Published: 14 June 1999
PDF: 6 pages
Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350795
Show Author Affiliations
Thomas Struck, Siemens AG (Germany)
Klaus-Dieter Roeth, Leica Microsystems Wetzlar GmbH (Germany)

Published in SPIE Proceedings Vol. 3677:
Metrology, Inspection, and Process Control for Microlithography XIII
Bhanwar Singh, Editor(s)

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