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Proceedings Paper

Precision improvement in diffraction measurement for the one-dimensional grating period
Author(s): Beomhoan O; Won Young Song; Byong Chon Park; Yeong-Uk Ko
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Paper Abstract

The precision laser diffractometer of the conventional-type has been developed for the 1D grating pitch measurement, and successful precision improvement has been made. At the first stage of this improvement, the rotary arm was set to be as long as 1.2 meter, and the precision goniometer has been used. Furthermore, a focusing lens has been inserted between the grating samples and the detection plane in order to prevent the measurement error from the beam alignment. The system has been more improved to meet the need for higher accuracy can precision so far. One of the two important modifications is the use of CCD camera-based detection system instead of visual evaluation. And, the precise value of the laser wavelength, with one more digit than before, is used. These two modifications contribute considerably in improving the accuracy of the measurement comparing with the previous one. The correction of axis wearing shift has been accomplished additionally to improve the accuracy at the current stage of the development. The measured values for the grating whose pitch is certified as 288 nm and 700 nm by the manufacturer, are 287.593 and 700.762 nm. The expanded uncertainties with a coverage factor of 2, is now improved to 0.005 and 0.014 nm for the 288 and 700 nm-grating, respectively. They are significantly less, about 1.10, than previous ones.

Paper Details

Date Published: 14 June 1999
PDF: 8 pages
Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); doi: 10.1117/12.350788
Show Author Affiliations
Beomhoan O, Inha Univ. (South Korea)
Won Young Song, Inha Univ. (South Korea)
Byong Chon Park, Korea Research Institute of Standards and Science (South Korea)
Yeong-Uk Ko, Korea Research Institute of Standards and Science (United States)

Published in SPIE Proceedings Vol. 3677:
Metrology, Inspection, and Process Control for Microlithography XIII
Bhanwar Singh, Editor(s)

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